Lift-off Photoresist: NPR9700/BLX series
We are focusing on developing photoresists (photosensitive materials) optimized for lift-off processes. In addition to single-layer positive resists, we offer a wide range of two-layer resists that are also suitable for fine-line processing. Compared to conventional products, our two-layer resists offer the advantages of enabling low-temperature baking and making it easier to control the amount of undercut. For more information, please visit the featured product site (Lift-off Photoresist site)
Features
NPR9700 series
Positive type resist
Exposure wavelength range: g-line to i-line (broadband compatible)
Easily enables the formation of an inverted taper shape under standard exposure conditions
Superior stripping performance
BLX series
Low temperature bake (125℃ to 160℃)
Easily control of undercut
Superior stripping performance
Value proposition
Compound semiconductors, optical devices, high-frequency devices, and hard-to-etch materials
Inquiries about our products and technology
For inquiries about products (SDS, TDS, usage instructions, pricing, purchase information, catalogs, regulations, samples, etc.), technologies, and business collaboration, please check our dedicated website before submitting your inquiry.
Inquiries