Photoresist: GRX
As a single-layer positive resist, GRX series exhibits good wettability, allowing it to be applied to large glass substrates using a spin coater or CAP coater. Metal etching properties have been enhanced by optimizing the pattern shape and composition.
Benefit
We provide the optimal positive resist for your process by leveraging our advanced formulation technology.
The GRX series enhances coating performance, enabling highly uniform film thickness on large glass substrates used for mask blanks. Additionally, by improving adhesion to the substrate, it helps suppress side etching. It also exhibits excellent stripping performance, ensuring smooth production.
Features
Exposure wavelength range: g-line to i-line (broadband compatible)
Can be coated using a spin coater and CAP coater
Applicable to large glass substrates
Improved in-plane uniformity of pattern line width through composition optimization
Compatible with laser lithography
Enhanced metal etching properties through pattern shape optimization
Minimized side etching and excellent substrate adhesion
Superior stripping performance
Value proposition
LCD, Mask blanks
Inquiries about our products and technology
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Inquiries