NAGASE's
Cleaning Technology
Supports Global
Manufacturing

Announcement of website opening to the public

Based on the four core technologies that support our wet chemical technologies, we are particularly focused on development and sales of chemicals that solve the trade-off between “protecting objects without damaging others”, which is generally considered difficult to achieve These chemicals are being developed domestically and internationally as precision cleaning solutions for advanced semiconductors, electronic components, FPD processes, and other new fields.

Cleaning processes are essential in all industries to stably achieve the required quality of products. In particular, precision cleaning is required in the semiconductor and electronic component manufacturing process, where it is necessary to remove dirt at the micrometer to submicron level. In recent years, the level of cleanliness that must be achieved through precision cleaning has become increasingly difficult due to the increasing complexity of component structures accompanying the development of microfabrication technology, particularly in cutting-edge semiconductors. Precision cleaning can improve product manufacturing efficiency (takt time) and yield, and with growing interest in environmental energy costs, the evolution of cleaning processes is becoming increasingly important. NAGASE uses the precision cleaning technology it has cultivated in fields that require microfabrication, such as semiconductors, electronic components, and flat panel displays (FPDs), to design cleaning solutions that meet the needs and processes of each customer. We are also developing and deploying precision cleaning solutions that have excellent cleaning properties while being environmentally friendly