Matelials of griding and polisshing
This product uses rare earth oxides and rare earth carbonates as raw materials.
Therefore, it has a high cerium concentration and excels in grindability and wear resistance.
Widely used for polishing photomask substrates, glass hard disk substrates,liquid crystal glass substrates, optical lenses, etc.
Products similar to this product
SiC polishing abrasive
The hexagonal α-type crystal is just below diamond in terms of hardness, and its chemical stability is excellent at room temperature. The result is a product with superior lapping and polishing capabilities, which is not affected by chemicals, and can spontaneously generate sharp grinding edges through fragmen-tation.
Alumina polishing abrasive
A is the most widely known abrasive powder, popularly called by the name Arundum.
One special feature of this product is that the toughness (tenacity) of the abrasive particles has been increased by fusing them with a small percentage of titanium.
A has the highest degree of toughness among all abrasive powders. This product is manufactured to sustain a consistent distribution of particle sizes.
