Selective Cleaning Technology

Selective cleaning refers to the process of making what is needed and removing what is unnecessary. For example, when washing the face in daily life, sebum contamination should be removed while a certain amount of oil should remain. Similarly, selective cleaning is required in the cleaning process in the industrial field. However, there is often a trade-off between increasing the removability of specific substances (stains) and reducing damage to the base material to which the stains are attached. The difficulty of this process increases as the variety of stains and base materials grows.
Materials used in the manufacturing process of semiconductors, semi-metals, FPDs, etc. often produce devices with multiple layers of different metals. The problem in this process is galvanic corrosion, in which the solubility of only certain metals increases due to the difference in ionization tendency between the metals in contact with each other. Selective corrosion protection is a method to suppress this galvanic corrosion. Selective residue removal removes only the residue of other specific metals and polymers and does not damage others. There is also a need for etch roughness control, which adjusts the surface roughness after the metal is etched, and constant velocity etching, which dissolves several different metals at the same rate. Our selective cleaning technology can meet them.