Chemicals for electronic components, optical components and FPD processes

Photolithography Stripper Lineup (by resist type)

Photolithography Stripper Lineup (by resist type)

Other chemical solutions will vary depending on the materials and metal types they come into contact with, so please contact us for details.

*Please inquire separately about etchants such as ITO and aluminum.

Stripper for photoresist N-300

N-300 is a non-aqueous photoresist stripper; N-300 can strip photoresist with almost no corrosion of Al or Si.

feature

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    Excellent removability from photoresist

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    Low damage to Al

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    Low damage to a-Si and poly-Si

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    specific gravity(25℃):0.97

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    viscosity(25℃)10mPa/S

Process example

N-300 60~90°C
Dip or Shower
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IPA room temperature 0.5 ~ 10min
Dip or Shower
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DIW room temperature z0.5~10min
Dip or Shower

Example of removing

initial
initial
after processing
after processing
Remove only photoresist

Notes.

Please read the SDS before use.

Stripper for photoresist N-342

N-342 is a water-based release agent for photoresists. N-342 is suitable when Al corrosion is likely to occur during removal. N-342 can be used for a long time by moisture control and is an environmentally friendly release agent.

feature

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    Excellent removability from photoresist

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    Not classified as hazardous under the Fire Service Act

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    Can be rinsed directly after removing

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    Bath life can be extended through moisture management

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    specific gravity(25℃):0.99

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    viscosity(25℃)10mPa/S

Process example

N-342 room temperature ~50°C
Shower
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N-342 room temperature ~50°C
0.5~5min
Shower
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DIW room temperature 0.5~5min
Shower
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DIW room temperature 0.5~5min
Shower

Example of removing

initial
initial
after processing
after processing
Remove only photoresist

Notes.

Please read the SDS before use.

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